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Surface relief formation in azobenzene-containing polymers using 325 nm holography, E. Nishioka, M. Kondo, A. Emoto, H. Ono and N. Kawatsuki, Jpn. J. Appl. Phys. 51 (2012) 021601. |
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Abstract |
| Surface relief (SR) formation in
polymethacrylate films with azobenzene side groups was investigated via
a holographic method using 325 nm He–Cd laser, which generated stable
cis isomers. Because the azobenzene molecules underwent both
photoinduced reorientation and photoisomerization according to the
polarization and intensity distribution of the interference beams,
formation of the SR structure depended on both the exposure energy and
polarization distribution. For intensity holography, both the
photogenerated cis isomer distribution and polarization direction of
the exposed beams played important roles in SR formation, which
accompanied the molecularly reoriented SR structure. For polarization
holography, a small SR structure accompanied the periodical molecular
orientation in the initial stage of polarization holography due to
uniform distribution of cis isomer. However, a SR structure larger than
that generated by intensity holography was produced in the
photostationary state. |